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Electron source, X-ray source and device using the X-ray source
专利权人:
发明人:
Huaping Tang,Zhiqiang Chen,Yuanjing Li,Yonggang Wang,Zhanfeng Qin
申请号:
US14904061
公开号:
US10014148B2
申请日:
2015.08.19
申请国别(地区):
US
年份:
2018
代理人:
摘要:
The present disclosure is directed to an electron source and an X-ray source using the same. The electron source of the present invention comprises: at least two electron emission zones, each of which comprises a plurality of micro electron emission units, wherein the micro electron emission unit comprises: a base layer, an insulating layer on the base layer, a grid layer on the insulating layer, an opening in the grid layer, and an electron emitter that is fixed at the base layer and corresponds to a position of the opening, wherein the micro electron emission units in the same electron emission zone are electrically connected and simultaneously emit electrons or do not emit electrons at the same time, and wherein different electron emission zones are electrically partitioned.
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