PROBLEM TO BE SOLVED: To provide a phase shift mask blank for manufacturing a phase shift mask used for manufacturing a liquid crystal display device, capable of preventing a light shielding film pattern at an undercut part from bending and breaking even if the mask is cleaned.SOLUTION: A phase shift mask blank for manufacturing a liquid crystal display device is used for manufacturing the liquid crystal device by using exposure light including at least one of i-line, h-line and g-line and is used for manufacturing the phase shift mask having an engraved substrate. The phase shift mask blank for manufacturing the liquid crystal display device has a transparent substrate and a light shielding film formed on the transparent substrate. The light shielding film is formed of a material having resistance to an etchant used in forming a phase shift part, and has a thickness of 200 nm or more.
