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专利权人:

株式会社東芝

发明人:

山辺 純成,桜井 直明,牧野 伸顕

申请号：

JP2008092497

公开号：

JP4987781B2

申请日:

2008.03.31

申请国别(地区):

JP

年份:

2012

代理人:

摘要：

A photocatalyst dispersing element includes: a photocatalyst material and a solvent. A hydrogen-ion exponent of the solvent is in a range of pH 2.1 or more and pH 5.7 or less. A method for manufacturing a photocatalyst dispersing element includes: adjusting a hydrogen-ion exponent in a solvent to be in a range of inhibiting aggregation of a photocatalyst material and of suppressing lowering of a degree of catalytic activity of the photocatalyst material and mixing the photocatalyst material with the solvent.

来源网站：

中国工程科技知识中心

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http://www.ckcest.cn/home/