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インプリント用モールド、インプリント方法、パターン形成体
专利权人:
凸版印刷株式会社
发明人:
矢澤 紘子,鈴木 学
申请号:
JP20130102073
公开号:
JP6115300(B2)
申请日:
2013.05.14
申请国别(地区):
日本
年份:
2017
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide a mold for an imprint suitable for forming a fine pattern, an imprint method using the same, and a pattern-formed body produced using the imprint method.SOLUTION: The mold for an imprint is composed of: a pattern transfer mold 20; and a residual resin curing mold 30. The pattern transfer mold 20 transfers a plurality of patterns 13 made of ruggedness to the resin layer 12 to be transferred applied to the surface of a base material 11 to a two-dimensional direction at fixed intervals. The residual resin curing mold 30, after the transfer of the patterns for a plurality of times by the pattern transfer mold 20, bulkly flattens an uncured resin 14 swelled out and remaining to the outer circumference of the pattern transfer mold 20 at a part of the resin layer 12 to be transferred and cures the same.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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