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パターン形成体の製造方法
专利权人:
富士フイルム株式会社
发明人:
後藤 雄一郎
申请号:
JP20160550335
公开号:
JP6267802(B2)
申请日:
2015.09.24
申请国别(地区):
日本
年份:
2018
代理人:
摘要:
Provided is a method for manufacturing a pattern-formed body, whereby it is possible to manufacture a pattern-formed body in which a film is formed on the surface of a relief pattern, while suppressing the occurrence of pattern defects. This method for manufacturing a pattern-formed body includes: a step for applying a first composition including a solvent and a film-forming component to the surface of a relief pattern; a step for applying a second composition having a lower surface tension than the first composition to a region on the relief pattern where the first composition was applied, before the surface of the relief pattern is exposed from the applied first composition; and a step for drying the first composition and the second composition applied to the relief pattern and forming a film on the surface of the relief pattern.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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