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Method for growing group III-nitride crystals in supercritical ammonia using an autoclave
专利权人:
The Regents of the University of California
发明人:
Fujito Kenji,Hashimoto Tadao,Nakamura Shuji
申请号:
US201414206558
公开号:
US9551088(B2)
申请日:
2014.03.12
申请国别(地区):
美国
年份:
2017
代理人:
Gates & Cooper LLP
摘要:
A method of growing high-quality, group-III nitride, bulk single crystals. The group III-nitride bulk crystal is grown in an autoclave in supercritical ammonia using a source material or nutrient that is a group III-nitride polycrystals or group-III metal having a grain size of at least 10 microns or more and a seed crystal that is a group-III nitride single crystal. The group III-nitride polycrystals may be recycled from previous ammonothermal process after annealing in reducing gas at more then 600° C. The autoclave may include an internal chamber that is filled with ammonia, wherein the ammonia is released from the internal chamber into the autoclave when the ammonia attains a supercritical state after the heating of the autoclave, such that convection of the supercritical ammonia transfers source materials and deposits the transferred source materials onto seed crystals, but undissolved particles of the source materials are prevented from being transferred and deposited on the seed crystals.
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中国工程科技知识中心
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