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intraosseous implant
专利权人:
UNIVERSITE DE GENEVE;Ecole Polytechnique Fédérale de Lausanne (EPFL)
发明人:
DESCOUTS, Pierre,ARONSSON, Björn-Owe,GRÄTZEL, Michael,VIORNERY, Carine,PECHY, Peter
申请号:
ES01996400
公开号:
ES2267862T5
申请日:
2001.11.19
申请国别(地区):
ES
年份:
2016
代理人:
摘要:
Compounds having phosphonic acid groups or a derivative thereof, corresponding to the general formula (I) €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ A-[P(O)(OH) 2 ] p €ƒ€ƒ€ƒ€ƒ€ƒ(I), or a pharmaceutically acceptable derivative thereof, wherein A means a residue of a linear, branched or cyclic, saturated or unsaturated, hydrocarbon residue with n carbon atoms, whereby said residue may be substituted by hydroxyl and/or carboxyl and optionally further interrupted by one or more oxygen and/or sulphur and/or nitrogen atoms, carrying p phosphonic acid groups, wherein n is a number from 4 to 70, and p is 3, 4, 5 or 6, are especially suitable to treat surfaces of Endosseous implants to be applied to a human or animal bone to improve osseointegration.
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