APPARATUS FOR TREATMENT OF A SUBSTRATE FOR A VACUUM DEPOSITION PROCESS IN A VACUUM PROCESSING MODULE, SYSTEM FOR TREATMENT AND HANDLING OF A SUBSTRATE, METHOD FOR TREATMENT OF A SUBSTRATE FOR A VACUUM DEPOSITION PROCESS IN A VACUUM PROCESSING MODULE, AND APPARATUS FOR LOADING A SUBSTRATE CARRIER INTO A VACUUM PROCESSING SYSTEM
APPLIED MATERIALS, INC.;WHITE, John M.;BUSCH, John D.;KIM, Kyung Bong;LINDENBERG, Ralph
发明人:
WHITE, John M.,BUSCH, John D.,KIM, Kyung Bong,LINDENBERG, Ralph
申请号：
WO2016EP59536
公开号：
WO2017071831(A1)
申请日:
2016.04.28
申请国别(地区):
世界知识产权组织国际局
年份:
2017
代理人:
摘要：
The present disclosure provides an apparatus (100) configured for treatment of a substrate (10) for a vacuum deposition process in a vacuum processing module. The apparatus (100) includes a substrate holder (110) configured to hold the substrate (10), a gas supply (130) configured to direct a stream of gas along a substrate surface of the substrate (10), and one or more conditioning devices configured for adjusting at least one physical and/or chemical property of the gas directed along the substrate surface, wherein the physical and/or chemical property of the gas is selected for a treatment of the substrate (10).
