您的位置: 首页 > 农业专利 > 详情页

COMPLIMENTARY METAL-OXIDE-SEMICONDUCTOR CIRCUIT HAVING TRANSISTORS WITH DIFFERENT THRESHOLD VOLTAGES AND METHOD OF MANUFACTURING THE SAME
专利权人:
Samsung Electronics Co., Ltd.
发明人:
Wang Wei-E,Hong Joon Goo
申请号:
US201615348916
公开号:
US2018076199(A1)
申请日:
2016.11.10
申请国别(地区):
美国
年份:
2018
代理人:
摘要:
A complimentary metal-oxide-semiconductor (CMOS) circuit including: a substrate; and a plurality of field-effect transistors on the substrate. Each of the field-effect transistors includes: a plurality of contacts; a source connected to one of the contacts; a drain connected to another one of the contacts; a gate; and a spacer between the gate and the contacts. The spacer of one of the field-effect transistors has a larger airgap than the spacer of another one of the field-effect transistors.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充