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pyrazole derivatives
专利权人:
F. HOFFMANN-LA ROCHE AG
发明人:
CÉDRIC GHELLAMALLAH,GUIDO GALLEY,PHILIPPE PFLIEGER,ROGER NORCROSS
申请号:
BR112013031324
公开号:
BR112013031324A2
申请日:
2012.06.06
申请国别(地区):
BR
年份:
2016
代理人:
摘要:
patent summary: "pyrazole derivatives". The present invention relates to a compound of formula Ia or Ib wherein R1 is hydrogen or phenyl, optionally substituted with halogen, C1-6 lower alkoxy or halogen-substituted lower alkoxy; R2 is hydrogen or lower alkyl; R3 is hydrogen or lower alkyl or phenyl optionally substituted with one or more substituents selected from halogen, cyano or halogen substituted lower alkoxy, or is pyridinyl, optionally substituted with halogen or lower alkyl substituted with halogen, or is pyrimidinyl, optionally substituted halogen substituted lower alkyl, or is pyrazinyl, optionally substituted with halogen, cyano or halogen substituted lower alkyl; R4 is hydrogen, lower alkyl or phenyl; z is a bond, -ch2- or -o-; or to a pharmaceutically suitable acid addition salt thereof. It has now been found that compounds of formulas ia and ib have good affinity for trace amine-associated receptors (taars), especially for taar1. The compounds may be used to treat depression, anxiety disorders, bipolar disorder, attention deficit hyperactivity disorder (ADHD), stress related disorders, psychotic disorders such as schizophrenia, neurological disorders such as parkinson's disease, neurodegenerative disorders. such as alzheimer's disease, epilepsy, migraine, hypertension, chemical dependence and metabolic disorders such as eating disorders, diabetes, diabetes complications, obesity, dyslipidemia, energy consumption and assimilation disorders, body temperature homeostasis disorders and malfunctions, sleep and circadian rhythm disorders, and cardiovascular disorders.resumo patente de invenção: "derivados de pirazol". a presente invenção refere-se a composto de fórmula ia ou ib em que r1 é hidrogênio ou fenila, opcionalmente substituído com halogênio, cn ou alcóxi inferior ou alcóxi inferior substituído com halogênio; r2 é hidrogênio ou alquila inferior; r3 é hidrogênio ou alquila inferior ou é fenila opcionalmente substituído com um ou mais substituintes,
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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