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COSMETIC METHOD
专利权人:
SHISEIDO COMPANY; LTD.
发明人:
Tomoko KIMURA,Naomi KANNO,Satoshi YAMAKI
申请号:
US14434976
公开号:
US20150297470A1
申请日:
2013.10.11
申请国别(地区):
US
年份:
2015
代理人:
摘要:
The present invention provides a cosmetic method having an excellent roughness correction effect and easily removing makeup cosmetic and sun care cosmetic.The cosmetic method of the present invention has a step of pasting the base material film surface of a thin film on the skin, a step of removing the support body of the pasted thin film, a step of applying a makeup cosmetic and/or a sun care cosmetic on the skin, wherein the thin film consists of a base material film of the thickness of 10 to 500 nm and a support body.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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