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COSMETIC METHOD
专利权人:
SHISEIDO COMPANY LTD.
发明人:
KIMURA, TOMOKO,木村朋子,KANNO, NAOMI,菅野直美,YAMAKI, SATOSHI,八卷悟史
申请号:
HK15110430.0
公开号:
HK1209634A
申请日:
2015.10.23
申请国别(地区):
HK
年份:
2016
代理人:
摘要:
The present invention provides a cosmetic method having an excellent secondary adhesion resistance effect. The cosmetic method of the present invention has a step of applying a cosmetic material on the skin, a step of pasting the base material film surface of a thin film on the skin, and a step of removing the support body of the pasted thin film, wherein the thin film consists of a base material film of the thickness of 10 to 500 nm and a support body.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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