CARRIER FOR SUPPORTING AT LEAST ONE SUBSTRATE DURING A SPUTTER DEPOSITION PROCESS, APPARATUS FOR SPUTTER DEPOSITION ON AT LEAST ONE SUBSTRATE, AND METHOD FOR SPUTTER DEPOSITION ON AT LEAST ONE SUBSTRATE
APPLIED MATERIALS, INC.;KELLER, Stefan;BRÜNING, Andre;SCHÜSSLER, Uwe;ZILBAUER, Thomas Werner;BANGERT, Stefan
发明人:
KELLER, Stefan,BRÜNING, Andre,SCHÜSSLER, Uwe,ZILBAUER, Thomas Werner,BANGERT, Stefan
申请号：
WO2015EP65366
公开号：
WO2017005290(A1)
申请日:
2015.07.06
申请国别(地区):
世界知识产权组织国际局
年份:
2017
代理人:
摘要：
A carrier (100) for supporting at least one substrate during a sputter deposition process is provided. The carrier (100) includes a carrier body (102) and an insulating portion provided at the carrier body (102). The insulating portion provides a surface (103) of an electrically insulating material, wherein the surface (103) is configured to face one or more sputter deposition sources during the sputter deposition process.
