CLEANING OF CVD PRODUCTION SPACES

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专利权人:

Wacker Chemie AG

发明人:

HERTLEIN, Harald,POPP, Friedrich

申请号：

EP20140712264

公开号：

EP2984034(B1)

申请日:

2014.03.20

申请国别(地区):

欧洲专利局

年份:

2017

代理人:

摘要：

Contamination of surfaces of polysilicon rods removed from a Siemens reactor in a polysilicon production facility is reduced by cleaning the production facility at least every other week with a cleaning liquid containing water, optionally also containing neutral surfactants.

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