TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING GMBH
发明人:
BRUNNE, Jens
申请号：
WO2015EP79799
公开号：
WO2017101982(A1)
申请日:
2015.12.15
申请国别(地区):
世界知识产权组织国际局
年份:
2017
代理人:
摘要：
The invention relates to an optical isolator comprising: a stop (1) which has an aperture (3) for passing laser radiation (5), said laser radiation passing through the aperture (3) in a first direction (R1), wherein the stop (1) serves to influence a plasma ignition threshold (IP1, IP2) for igniting a plasma in order to suppress the passage of laser radiation propagating in a second direction, opposite to the first, through the aperture (3). For laser radiation which impinges on the second side (2b) of the stop (1) in a vicinity (6b) of the aperture (3), the stop (1) has a lower plasma ignition threshold (IP2 < IP1) than for laser radiation (5) which impinges on the first side (2a) of the stop (1) in a vicinity (6a) of the aperture (3). The invention also relates to a driver laser arrangement and an EUV radiation production apparatus comprising at least one of such optical isolator.
