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SEMICONDUCTOR DEVICES INCLUDING A METAL OXIDE SEMICONDUCTOR STRUCTURE
专利权人:
SAMSUNG ELECTRONICS CO., LTD.
发明人:
JUNG Jae-Hyun,JEON Chang-Ki,KIM Min-Hwan,LEE Kyu-Ok,KIM Jung-Kyung,JANG Jae-June,CHO Su-Yeon
申请号:
US201615227490
公开号:
US2017040422(A1)
申请日:
2016.08.03
申请国别(地区):
美国
年份:
2017
代理人:
摘要:
A semiconductor device, including a substrate; a first conductive type well and a second conductive type body region at an upper portion of the substrate; a field plate on the first conductive type well, the field plate including a semiconductor material or an insulative nitride; and a gate electrode extending in a lateral direction on the substrate from a lateral portion of the second conductive type body region to a lateral portion of the first conductive type well, the gate electrode overlapping the field plate.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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