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PLASMA GENERATING ELEMENT, PLASMA GENERATING APPARATUS, AND ELECTRICAL EQUIPMENT
专利权人:
シャープ株式会社
发明人:
山本 聡彦
申请号:
JP2015002436
公开号:
JP6537274B2
申请日:
2015.01.08
申请国别(地区):
JP
年份:
2019
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide a plasma generation element having a simple structure.SOLUTION: A plasma generation element 2 comprises: a first substrate 11 having a first principal surface 11a; a second substrate 21, having a second principal surface 21a, which is arranged so that the second principal surface 21a faces the first principal surface 11a; a plurality of first pattern electrode parts 31 which are arranged to be in line at intervals on the first principal surface 11a; and a plurality of second pattern electrode parts 41 which are arranged to be in line at intervals on the second principal surface 21a. The plurality of first pattern electrode parts 31 and the plurality of second pattern electrode parts 41 are arranged at a distance so that portions facing each other are included therein. As a result, a plasma generation part is provided in the portions where the first pattern electrode part 31 and the second pattern electrode part 41 face each other. Thereby, plasma is generated in the plasma generation part when a high voltage is applied between the first pattern electrode part 31 and the second pattern electrode part 41.SELECTED DRAWING: Figure 4
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