PERISHABLE ELEMENT FOR PARTICLE BOMBARDMENT, SET OF DEVICES FOR PARTICLE BOMBARDMENT AND PERISHABLE ELEMENT AND METHOD FOR DETERMINING THE ETCHING PATTERN VIA PARTICLE BOMBARDMENT OF A TARGET
The invention relates to a perishable element (1) provided with a target (2) for the particle bombardment, designed to carry out the physical deposition of a thin vapour-phase layer over a substrate (3), said perishable element (1) comprising a base layer (4) on which the target (2) is deposited, said target being designed to be sputtered by the particle bombardment, wherein the target is formed by at least one layer (21) in which a plurality of zones (xi, yi) are defined, having an average thickness (ej(xi, yi)) that is variable between the zones (xi, yi), said average thicknesses (ej(xi, yi)) of each zone (xi, yi) being dimensioned such that, in determined bombardment conditions, all the zones (xi, yi) have an identical ion sputtering time (tj). The invention also relates to a set of devices for particle bombardment (5) and perishable element (1) and a method for the production of the perishable element (1).
