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Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method
专利权人:
NIKON CORPORATION
发明人:
Shibazaki Yuichi
申请号:
US201414581338
公开号:
US9588443(B2)
申请日:
2014.12.23
申请国别(地区):
美国
年份:
2017
代理人:
Oliff PLC
摘要:
A carrier apparatus positions a chuck member above a wafer mounted on a fine movement stage, relatively moves the chuck member and the fine movement stage in a vertical direction, makes the chuck member approach a position which is a predetermined distance away from the upper surface of the wafer, makes the chuck member hold the wafer from above in a non-contact manner, and makes the chuck member holding the wafer and the fine movement stage move apart within a predetermined plane after making the chuck member holding the wafer and the fine movement stage move apart in the vertical direction. Further, the carrier apparatus loads the wafer held in a non-contact manner from above by the chuck member on the fine movement stage.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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