您的位置: 首页 > 农业专利 > 详情页

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE HAVING REDUCED ON-STATE RESISTANCE AND STRUCTURE
专利权人:
SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
发明人:
SEDDON Michael J.,CARNEY Francis J.
申请号:
US201615208794
公开号:
US2017110452(A1)
申请日:
2016.07.13
申请国别(地区):
美国
年份:
2017
代理人:
摘要:
A semiconductor device includes a singulated region of semiconductor material having a first major surface and a second major surface opposite to the first major surface. In one embodiment, the second major surface includes a recessed surface portion bounded by opposing sidewall portions extending outward from the region of semiconductor material in cross-sectional view. The sidewall portions have outer surfaces defining peripheral edge segments of the singulated region of semiconductor material. An active device region is disposed adjacent to the first major surface and a first conductive layer is disposed adjoining the recessed surface portion. The recessed surface portion provides a semiconductor device having improved electrical characteristics, and the sidewall portions provide a semiconductor device that is less susceptible to warpage, breakage, and other reliability issues.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充