To provide a method for manufacturing a high aspect ratio structure, by which sticking can be further reduced, a high aspect ratio structure, and an X-ray imaging apparatus using the structure.SOLUTION: A manufacturing method of the present invention includes: alternately forming a plurality of first regions where a first resist layer 133 is disposed as extending between third regions AR3 adjacent to each other to be formed as described below, and a plurality of second regions where no resist layer is disposed, in each of a plurality of fourth regions AR4 to be formed as described below on a main surface of a substrate 13； forming a plurality of holes PE from each surface of the plurality of second regions； alternately and periodically forming a plurality of the third regions AR3 where a second resist layer is disposed and a plurality of the fourth regions AR4 where no resist layer is disposed, on the plurality of first regions and the plurality of second regions； and immersing the substrate in an etching solution so as to form a recess in each of the plurality of fourth regions AR4 in the substrate 13. At least part of the plurality of holes PE extend downward in the first region.SELECTED DRAWING: Figure 7【課題】本発明は、スティッキングの発生をより低減できる高アスペクト比構造物の製造方法および高アスペクト比構造物ならびにこれを用いたＸ線撮像装置を提供する。【解決手段】本発明の製造方法は、基板１３の主面において、後述で形成される複数の第４領域ＡＲ４それぞれに、後述で形成される互いに隣接した第３領域ＡＲ３間に渡る第１レジスト層１３３を設けた複数の第１領域とこれを設けない複数の第２領域とを交互に形成し、複数の第２領域の各表面から複数の穴ＰＥを形成し、複数の第１領域と複数の第２領域との上に、第２レジスト層を設けた複数の第３領域ＡＲ３とこれを設けない複数の第４領域ＡＲ４とを交互に周期的に形成し、エッチング液の中に浸漬することによって、基板１３における複数の第４領域ＡＲ４それぞれに凹部を形成する。ここで、複数の穴ＰＥのうちの少なくとも一部は、第１領域の下方に延びる。【選択図】図７
