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表面保護部材及びウエーハの加工方法
专利权人:
株式会社ディスコ
发明人:
樋田 美玲,原 利男
申请号:
JP20130040893
公开号:
JP6061731(B2)
申请日:
2013.03.01
申请国别(地区):
日本
年份:
2017
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide a surface protective member which is easy to remove from the surface of a wafer and eliminates or reduces a remaining paste or adhesive on the surface of a device, and a method for manufacturing a wafer by using the surface protective member.SOLUTION: A surface protective member which protects a surface of a wafer having a device area having a plurality of devices formed on the surface, and a circumference excessive area surrounding the device area, comprises a disk-like base having a recess larger than the device area of the wafer and smaller than a diameter of the wafer on a surface thereof and having a diameter equal to or larger than the diameter of the wafer, and an uneven absorption member disposed in the recess. A plurality of through holes from a bottom of the recess to a rear surface are formed in the disk-like base.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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