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Electrostatic discharge (ESD) protection circuits, integrated circuits, systems, and methods for forming the ESD protection circuits
专利权人:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
发明人:
Lee Shu-Chuan,Chen Kuo-Ji,Ma Wade
申请号:
US201615171280
公开号:
US9659923(B2)
申请日:
2016.06.02
申请国别(地区):
美国
年份:
2017
代理人:
Hauptman Ham, LLP
摘要:
An electrostatic discharge (ESD) protection circuit includes a field oxide device in a substrate, wherein the field oxide device is coupled between an input/output (I/O) pad and a first terminal. The field oxide device includes a drain end and a source end having a first type of dopant. The field oxide device includes a field oxide structure between the drain end and the source end. The field oxide structure has a top surface co-planar with a top surface of a substrate. A first doped region having a second type of dopant is adjacent to the drain end. A second doped region having the second type of dopant is adjacent to the source end. The field oxide structure is in a well and the source end and the drain end are separate from the well. The substrate has the second type of dopant and is around the field oxide structure.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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