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CULTIVATION APPARATUS AND CULTIVATION METHOD
专利权人:
株式会社FUJI;FUJI CORP
发明人:
YOSHIDA NAOFUMI,吉田 直史,ISOZUMI JOJI,五十棲 丈二
申请号:
JP2016237982
公开号:
JP2018093735A
申请日:
2016.12.07
申请国别(地区):
JP
年份:
2018
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide cultivation apparatus for growing a cultivation subject in a more proper condition.SOLUTION: Provided is a cultivation apparatus 20 using a cultivation plate having a placing portion 51 on which a cultivation subject P is placed, and a housing part 52 for housing a cultivation liquid which is supplied to the cultivation subject P, having a support portion 37 for supporting the placing portion 51, and a support portion 36 for supporting the housing portion 52, and further having a support mechanism for supporting a plurality of stages of the cultivation plates. The support mechanism has any one or more of the followings: a support portion in which the placing portion 51 and the housing portion 52 are arranged at a first interval in the predetermined stage and the placing portion 51 and the housing portion 52 are arranged at a second interval in the stage different from the predetermined stage; and a support portion in which the interval between the placing portion 51 and the housing portion 52 is changeable in the predetermined stage.SELECTED DRAWING: Figure 1【課題】栽培物をより適正な状態で育成する栽培装置を提供する。【解決手段】栽培物Pを載置する載置部51と、栽培物Pに供する栽培液を収容する収容部52とを有する栽培プレートを用いる栽培装置20であって、載置部51を支持する支持部37と、収容部52を支持する支持部36とを有し、栽培プレートを複数段支持する支持機構、を備える。この支持機構は、所定段においては載置部51と収容部52とが第1間隔で配置され、所定段と異なる段では載置部51と収容部52とが第1間隔と異なる第2間隔で配置される支持部を有するか、所定段において載置部51と収容部52との間隔を変更可能な支持部を有するか、のうちいずれか1以上である。【選択図】図1
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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