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Method for protecting substrate
专利权人:
Masayuki Iwasaki;Keiji Koike;Shiro Ogata;Yoshimitsu Matsui
发明人:
Keiji Koike,Masayuki Iwasaki,Shiro Ogata,Yoshimitsu Matsui
申请号:
US12736418
公开号:
US08906298B2
申请日:
2009.04.10
申请国别(地区):
US
年份:
2014
代理人:
摘要:
The present invention relates to a method for preventing or reducing contamination of a surface of a substrate, or protecting a surface of a substrate by making a surface of a substrate hydrophilic, by means of arranging, successively in relation to the substrate, a first layer containing a negatively-charged substance, and a second layer containing a positively-charged substance or containing a positively-charged substance and a negatively-charged substance on the surface of the substrate or in a surface layer of the substrate. In accordance with the present invention, a novel method for preventing or reducing adhesion of contaminants, and color degradation or color change of a substrate over time, can be provided.
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中国工程科技知识中心
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