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DERIVADOS DE HETEROARILO COMO MODULADORES DE NACHR ALFA 7
专利权人:
LUPIN LIMITED
发明人:
SINHA, NEELIMA,JANA, GOURHARI,SACHCHIDANAND, SACHCHIDANAND,KURHADE, SANJAY PARLHAD,KARCHE, NAVNATH POPAT,HAJARE, ANIL KASHIRAM,TILEKAR, AJAY RAMCHANDRA,PALLE, VENKATA P.,KAMBOJ, RAJENDER KUMAR
申请号:
PE0019692013
公开号:
PE07032014A1
申请日:
2012.02.22
申请国别(地区):
PE
年份:
2014
代理人:
摘要:
Heteroaryl refers to a compound of formula (i), where z is n or s, and RA (RA) is H, alkyl, optionally substituted or C1 to C20, halogen, Nitro, among others, alquenilo C1 - C6 optionally substituted by Halogen or nitro, cyano, among others r1 is aryl optionally substituted by Halogen Nitro, cyano, among others, optionally substituted heteroaryl OXO, halogen, Nitro,Among others, R2 is H, alkyl, optionally substituted C20 C1 - Halogen, Nitro, cyano, among others R3 is C1 - C20 alkyl optionally substituted with nitro, cyano, Oxo, among others M is 0 to 3 R4 is halogeno, cyano, optionally substituted oxo alkyl, cyano, Nitro, among others R5 and R6 are h, R7ac (= o) - alkyl, optionally substituted C1 to C20 OXO, cyano, Nitro,Among others, R7a is C1 - C20 alkyl optionally substituted with nitro, cyano, Oxo, among others, alquenilo C1 - C6 optionally substituted by Halogen or nitro, cyano, among others.Preferred compounds are: 4 - (5 - (4-chlorophenyl) - 4 - methyl - 2 - 3 - propionilotiofen - ilo) benzene sulfonamide, 4 - (5 - (chlorophenyl) - 4 - methyl - 2 - 3 - propionilotiofen - ilo) benzene sulfonamide, 4 - (4 - methyl - 2 - Propionyl - 5 - (4 - tolilo) thiophene-3 - ilo) benzene sulfonamide, among others. It also relates to a Pharmaceutical composition.These compounds are modulators of alpha7 nicotinic acetylcholine receptors (Alpha 7 nAChR subtype) and are useful in the treatment of mild cognitive impairment, Alzheimers disease, senile dementia, among othersREFERIDA A UN COMPUESTO HETEROARILO DE FORMULA (I), DONDE Z ES S, O Y N(Ra) Ra ES H, ALQUILO C1-C20 OPCIONALMENTE SUSTITUIDO CON O, HALOGENO, NITRO, ENTRE OTROS, ALQUENILO C1-C6 OPCIONALMENTE SUSTITUIDO CON HALOGENO, O, NITRO, CIANO, ENTRE OTROS R1 ES ARILO OPCIONALMENTE SUSTITUIDO CON HALOGENO, NITRO, CIANO, ENTRE OTROS, HETEROARILO OPCIONALMENTE SUSTITUIDO CON NITRO, OXO, HALOGENO, ENTRE OTROS R2 ES H, ALQUILO C1-C20 OPCIONALMENTE SUSTITUIDO HALOGENO, NITRO, CIANO, ENTRE OTROS R3 ES ALQUILO C1-C20 OPCIONALMEN
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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