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Exposure management and control system and method
专利权人:
发明人:
申请号:
EP00305882.3
公开号:
EP1069807B1
申请日:
2000.07.12
申请国别(地区):
EP
年份:
2014
代理人:
摘要:
An exposure management and control system and method for x-ray technique selection is provided. Optimal x-ray technique, which affects image quality, can be accurately predetermined to use for any application. A patient model is combined with a closed loop brightness control, using a parameter that does not affect image quality. This is used to create a control system that operates as a knowledge based control system. The x-ray system brightness control system comprises a first and second regulator. The first regulator is an image quality, or brightness, regulator. The brightness regulator can have multiple functions, such as peak mA control, power limiter, skin dose limiter, and an override function. The second regulator is a dose error regulator. The second regulator is independent of the first regulator, and cooperates with the first regulator to provide x-ray technique optimization independent of brightness control.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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