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A COSMETIC SUBSTRATE AND A COSMETIC CONTAINING THE COSMETIC SUBSTRATE
专利权人:
LIMITED;SEIWA KASEI COMPANY
发明人:
Masato YOSHIOKA,Yuta HOMMA,Shota TOMIHISA
申请号:
US15572410
公开号:
US20180133143A1
申请日:
2017.01.17
申请国别(地区):
US
年份:
2018
代理人:
摘要:
A cosmetic substrate composed of a silylated amino acid/silane compound copolymer obtained by poly-condensing at least one silylated amino acid having a specific chemical structure and at least one silane compound having a specific chemical structure, wherein the reaction molar ratio of silylated amino acid:silane compound is in the range of 1:5 to 1:150, and a cosmetic containing 0.01% by mass or more and 20% by mass or less of the cosmetic substrate are provided.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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