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光電変換装置および医療機器
专利权人:
SEIKO EPSON CORP
发明人:
KUDO MANABU,工藤 学
申请号:
JP2012206850
公开号:
JP2014063808A
申请日:
2012.09.20
申请国别(地区):
JP
年份:
2014
代理人:
摘要:
PROBLEM TO BE SOLVED: To effectively prevent desorption of hydrogen from a semiconductor layer after hydrogen treatment in a process of forming a photoelectric conversion layer of a chalcopyrite semiconductor.SOLUTION: A photoelectric conversion device comprises: a transistor 12 including a semiconductor layer 51 which is subjected to hydrogen treatment a photoelectric conversion element 14 having a photoelectric conversion layer 43 formed by a chalcopyrite semiconductor and a hydrogen desorption prevention layer 30 for preventing desorption of hydrogen from the semiconductor layer 51, which is arranged between the semiconductor layer 51 and the photoelectric conversion layer 43 and formed from a silicon nitride (SiNx). The hydrogen desorption prevention layer 30 includes an insulation layer 26 with a film thickness T1 and an insulation layer 32 with a film thickness T2 (T1
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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