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Scintillator array, method of manufacturing scintillator array, radiation detector, and radiation inspection device
专利权人:
KABUSHIKI KAISHA TOSHIBA;TOSHIBA MATERIALS CO., LTD.
发明人:
Makoto Hayashi,Hiroyasu Kondo,Hiroshi Ichikawa,Yoshitaka Adachi,Yukihiro Fukuta
申请号:
US16429367
公开号:
US10739474B2
申请日:
2019.06.03
申请国别(地区):
US
年份:
2020
代理人:
摘要:
A scintillator array includes a first scintillator element, a second scintillator element, and a reflector provided between the first and second scintillator elements and having a width of 80 μm or less therebetween. Each scintillator element includes a polycrystal containing a rare earth oxysulfide phosphor, the polycrystal having a radiation incident surface of 1 mm or less×1 mm or less in area. An average crystal grain diameter of the polycrystal is not less than 5 μm nor more than 30 μm, the average crystal grain diameter being defined by an average intercept length of crystal grains in an observation image of the polycrystal with a scanning electron microscope. A maximum length or a maximum diameter of defects on the polycrystal is 40 μm or less.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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