SCHMIDT, Beat,HEAU, Christophe,MAURIN-PERRIER, Philippe
申请号：
EP20080842172
公开号：
EP2201593(B1)
申请日:
2008.10.09
申请国别(地区):
欧洲专利局
年份:
2017
代理人:
摘要：
A method of treating a surface of at least one part by individual sources of an electron cyclotron resonance plasma is characterized by subjecting the part(s) to at least one movement of revolution with regard to at least one fixed linear row of elementary sources. The linear row or rows of elementary sources are disposed parallel to the axis or axes of revolution of the part or parts.
