您的位置: 首页 > 农业专利 > 详情页

Device for killing harmful organisms at surface and/or in edge layer of pourable plant products includes a chamber with gas flow for isolating and swirling the products and movable source emitting ultraviolet-, electron- /microwave energy
专利权人:
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
发明人:
申请号:
DE200620015636U
公开号:
DE202006015636(U1)
申请日:
2006.10.12
申请国别(地区):
德国
年份:
2007
代理人:
摘要:
The device for killing harmful organisms at surface and/or in edge layer of pourable plant products includes gas and water supplyable chamber (1) with gas flow for isolating and swirling the products and movable source that emits ultraviolet-, electron- /microwave energy in the chamber. The gas flow (3) is directed in such a way that its effect is partially against the force of gravity. The ultraviolet energy exhibits a wavelength of = 230 nm. The source is arranged within the chamber or is integrated in a chamber wall. The device for killing harmful organisms at surface and/or in edge layer of pourable plant products, includes gas and water supplyable chamber (1) with gas flow for isolating and swirling the products and movable source that emits ultraviolet-, electron- /microwave energy in the chamber. The gas flow (3) is directed in such a way that its effect is partially against the force of gravity. The ultraviolet energy exhibits a wavelength of = 230 nm. The source is arranged within the chamber or is integrated in a chamber wall. The gas is a protective gas, an inert gas, air or a reaction product of undesirable chemical reactions such as carbon dioxide. The gas is sterilizable or germ reducible by a mechanism before entering into the chamber, and is heatable by another mechanism. The chamber comprises a reflector (7) formed as electron target for reflecting the energies. The plant products are processed in continuous- and batch processes by members. The chamber inner walls and surfaces areas of the plant products are subjected with the energies, during the isolation and swirling of the products. The flow properties of the gas are adjustable within the chamber.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充