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Components with an atomic layer deposition coating and methods of producing the same
专利权人:
Agilent Technologies; Inc.
发明人:
Elizabeth Carr,Kevin P. Killeen
申请号:
US14597159
公开号:
US10767259B2
申请日:
2015.01.14
申请国别(地区):
US
年份:
2020
代理人:
摘要:
Liquid chromatography and gas chromatography components with a conformal protective coating on internal surfaces thereof and methods for producing the same are provided. The conformal protective coating is formed via an atomic layer deposition (ALD) process. The components and methods of the present disclosure find use in providing protective coatings for liquid chromatography and gas chromatography components that are compatible with bioanalytical separations and sensitive trace analyses.
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