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Magnetic tunnel junctions and methods of forming magnetic tunnel junctions
专利权人:
Micron Technology, Inc.
发明人:
Sandhu Gurtej S.
申请号:
US201614989556
公开号:
US9691817(B2)
申请日:
2016.01.06
申请国别(地区):
美国
年份:
2017
代理人:
Wells St. John, P.S.
摘要:
A method of forming a line of magnetic tunnel junctions includes forming magnetic recording material over a substrate, non-magnetic material over the recording material, and magnetic reference material over the non-magnetic material. The substrate has alternating outer regions of reactant source material and insulator material along at least one cross-section. The reference material is patterned into a longitudinally elongated line passing over the alternating outer regions. The recording material is subjected to a set of temperature and pressure conditions to react with the reactant of the reactant source material to form regions of the dielectric material which longitudinally alternate with the recording material along the line and to form magnetic tunnel junctions along the line which individually comprise the recording material, the non-magnetic material, and the reference material that are longitudinally between the dielectric material regions. Other methods, and lines of magnetic tunnel junctions indepe
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