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DIELECTRIC BARRIER DISCHARGE-TYPE ELECTRODE STRUCTURE FOR GENERATING PLASMA HAVING CONDUCTIVE BODY PROTRUSION ON ELECTRODES
专利权人:
SP TECH CO.; LTD.
发明人:
Hee Sik Sohn
申请号:
US14414517
公开号:
US20150137677A1
申请日:
2013.06.27
申请国别(地区):
US
年份:
2015
代理人:
摘要:
Provided is a dielectric barrier discharge-type electrode structure for generating plasma. The electrode structure, according to the present invention, comprises: an upper conductive body electrode and a lower conductive body electrode; at least one conductive body electrode protrusion portion, which is formed on at least one surface of the upper conductive body electrode and/or the lower conductive body electrode; a dielectric layer which is formed on at least one of the inner surfaces of the upper conductive body electrode and the lower conductive body electrode that face each other, so as to have a substantially uniform thickness; and a specific gap (d) which is formed between the upper and lower conductive body electrodes and the dielectric layer, or between dielectric layers, due to the protruding effect of the conductive body electrode protrusion portion when the upper conductive body electrode and the lower conductive body electrodes come into close contact, wherein the plasma is generated by applying a pulse power or an alternating power to the upper conductive body electrode and the lower conductive body electrode.
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