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絶縁被膜の形成方法、電子基板の製造方法および感光性樹脂組成物
专利权人:
株式会社タムラ製作所
发明人:
長谷川 靖幸,邱 芳明
申请号:
JP20150172564
公开号:
JP6278933(B2)
申请日:
2015.09.02
申请国别(地区):
日本
年份:
2018
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide a method for forming an insulation coating film by which upon forming an insulation coating film using a photosensitive resin composition, a cross-sectional shape of an opening end in the insulation coating film can be adjusted.SOLUTION: The method for forming an insulation coating film of the present invention includes an application step of forming a coating film, an exposure step and a development step, in which a haze value of the coating film at a wavelength of 385 nm and a cross-sectional shape of an opening end in the insulation coating film satisfy one of the following conditions (a) to (c). Condition (a): the haze value is 25% or less and the cross-sectional shape of the opening end is rectangular. Condition (b): the haze value is more than 25% and 80% or less, the cross-sectional shape of the opening end is tapered, and the taper angle of the cross-sectional shape is 60° or more and 85° or less. Condition (c): the haze value is more than 80%, the cross-sectional sh
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