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SYSTEM OF MAKING SUB-SURFACE PHOTOALTERATIONS IN A MATERIAL
专利权人:
AMO DEVELOPMENT; LLC
发明人:
ZADOYAN, RUBEN,KARAVITIS, MICHAEL,KURTZ, RONALD
申请号:
CA2706367
公开号:
CA2706367C
申请日:
2008.11.19
申请国别(地区):
CA
年份:
2016
代理人:
摘要:
A system for sub-surface photoalteration of a material comprising a laserconfigured toproduce a pulsed laser beam having a first pulse energy and a first focalpointseparation, a controller coupled to the laser and a scanner coupled to thecontroller.The controller is configured to determine the first pulse energy and the firstfocal pointseparation based on a relationship of pulse energy and focal point separationcombinations enabling layer separation of the material by photoalteration. Thecontrolleris further configured to select a focal point depth using the first pulseenergy and the firstfocal point separation based on a relationship of minimum focal point depthand acombination of minimum pulse energy and focal point separation. The scanner isconfigured to position the pulsed laser beam at the focal point depth selectedby thecontroller.
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中国工程科技知识中心
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