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VAPOR DEPOSITION UNIT, VAPOR DEPOSITION DEVICE, AND VAPOR DEPOSITION METHOD
专利权人:
SHARP KABUSHIKI KAISHA
发明人:
KOBAYASHI YUHKI,KAWATO SHINICHI
申请号:
US201615552796
公开号:
US2018047904(A1)
申请日:
2016.02.18
申请国别(地区):
美国
年份:
2018
代理人:
摘要:
A vapor deposition unit (1) includes: a vapor deposition mask (10); a limiting plate unit (20) having limiting plates (22); and a vapor deposition source (30). The vapor deposition source (30) includes: a plurality of first openings (31) for injection of vapor deposition particles; and at least one second opening (32) for pressure release, wherein each of the first openings (31) is provided in a corresponding one of limiting plate openings (23) between the limiting plates (22) in a plan view, and the at least one second opening (32) is provided in such a position as not to face the limiting plate openings (23) in a plan view.
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