Apparatus and methods are provided for cleaning, disinfecting, and/or sterilizing a device. More specifically, a first treatment chamber can be configured to conduct a first treatment stage therein at a first pressure, a first temperature, and a first sterilant concentration. A first passage can be operatively connected to the first treatment chamber and a second treatment chamber can be operatively connected to the first passage and in communication with the first chamber via the first passage. The second chamber can be configured to conduct a second treatment stage therein at a second pressure, a second temperature, and a second sterilant concentration. An object can be treated in the first treatment chamber and moved to the second treatment chamber via the first passage to be treated in the second treatment chamber.提供用於將一裝置清潔、消毒及/或滅菌的設備及方法。更具體地，一第一處理室可經組態以在一第一壓力、一第一溫度、及一第一滅菌劑濃度下在其中進行一第一處理階段。一第一通道可操作地連接至該第一處理室，且一第二處理室可操作地連接至該第一通道並經由該第一通道與該第一室連通。該第二室可經組態以在一第二壓力、一第二溫度、及一第二滅菌劑濃度下在其中進行一第二處理階段。一物體可係在該第一處理室中處理，且經由該第一通道移動至該第二處理室，以在該第二處理室中處理。
