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Mask plate and method of patterning using the mask plate
专利权人:
BOE TECHNOLOGY GROUP CO., LTD.;BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人:
Wang Dong
申请号:
US201414525156
公开号:
US9459524(B2)
申请日:
2014.10.27
申请国别(地区):
美国
年份:
2016
代理人:
Blakely Sokoloff Taylor & Zafman LLP
摘要:
The embodiment of the present invention provides a mask plate and a method of patterning using the mask plate, the mask plate comprising a light shielding area and an opening area, the edge of the opening area being in a concave-convex shape. The embodiment of the present invention, by setting the edge of the opening area of the mask plate in a concave-convex shape, can improve linearity of the matrix edge formed after the processes of coating, exposing, developing, roasting of the photoresist, so as to prevent the problem of generating a jagged or a wavy shape at the matrix edge of a color filter in a color film substrate, thereby improving uniformity of color display of a liquid crystal display. The effect is particularly significant for a product using a negative photoresist or with a relatively thin line width in the formed matrix.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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