Refers to a process for the preparation of a Progressive organosilicon photoresist Polymer which comprises reacting a monomer of formula (i) with a compound of formula (iv) in a mixture of ethanol \/ water and in the presence of a basic Compound selected from ammonia, monoalqui Lamina, among others where r is a compound of formula (i), (ii) or (iii) R1, R2, R3,R4 and R5 are each C1 - C6 h, alkyl, cycloalkyl C3 C6, NH2, among others, R6, R7, R8 and R9 are each h, alkyl of C1 - C6, NH2, among others l is a - ch = N - O - (CH2) - or - C (o) - NH -, RA, RB and RC are each c1-c6 alkyl, cycloalkyl alquenilo C2 - C6 C3 C6 or phenyl p is 2 to 4 S and T are Rd is 0 OR 1 C1 - C6 alkyl RE, RF and RG are each c1-c6 alkyl, alquenilo C2 - C6Cycloalkyl C3 C6 or phenyl W1 and W2 are 0 OR 1. Also refers to Cosmetic or Dermatological composition comprising Said Polymer, which is useful for protection from UV RadiationSE REFIERE A UN PROCEDIMIENTO PARA LA PREPARACION DE UN POLIMERO FOTOPROTECTOR PROGRESIVO DE ORGANOSILICIO QUE COMPRENDE LA REACCION DE UN MONOMERO DE FORMULA (I) CON UN COMPUESTO DE FORMULA (IV) EN UNA MEZCLA DE ETANOL/ AGUA Y EN PRESENCIA DE UN COMPUESTO BASICO SELECCIONADO DE AMONIACO, MONOALQUILAMINA, ENTRE OTROS EN DONDE R ES UN COMPUESTO DE FORMULA (i), (ii) O (iii) R1, R2, R3, R4 Y R5 SON CADA UNO H, ALQUILO C1-C6, CICLOALQUILO C3-C6, NH2, ENTRE OTROS R6, R7, R8 Y R9 SON CADA UNO H, ALQUILO C1-C6, NH2, ENTRE OTROS L ES -CH=N- O -(CH2)-O-C(O)-NH- Ra, Rb Y Rc SON CADA UNO ALQUILO C1-C6, ALQUENILO C2-C6, CICLOALQUILO C3-C6 O FENILO p ES DE 2 A 4 s Y t SON 0 O 1 Rd ES ALQUILO C1-C6 Re, Rf Y Rg SON CADA UNO ALQUILO C1-C6, ALQUENILO C2-C6, CICLOALQUILO C3-C6 O FENILO w1 Y w2 SON 0 O 1. SE REFIERE TAMBIEN A COMPOSICION COSMETICA O DERMATOLOGICA QUE COMPRENDE DICHO POLIMERO, EL CUAL ES UTIL PARA PROTECCION DE LA RADIACION UV
