<P>PROBLEM TO BE SOLVED: To solve a problem that although a dummy pattern image is formed in advance based upon design data so as to make a comparison with the shape of an actual opening and automatic inspection is carried out, a desired pattern image generated from the design data by using technique for image processing can not be practically used for the inspection since the desired pattern image does not have completely matching corner states, contrast, etc., with respect to the shape of an opening of an actually manufactured stencil mask and may cause misdetection. ??<P>SOLUTION: Disclosed is the stencil mask defect inspecting method and device which irradiates the stencil mask obliquely with linear parallel light and measures the shape of the opening 8 using a non-reflection image of an image obtained by imaging surface reflected light, so as to inspect a defect of the opening 8. ??<P>COPYRIGHT: (C)2010,JPO&INPIT ??
