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ELECTRON BEAM IRRADIATION DEVICE AND ELECTRON BEAM IRRADIATION METHOD
专利权人:
HAMAMATSU PHOTONICS K.K.
发明人:
Tatsuya MATSUMURA
申请号:
US16067872
公开号:
US20200266024A1
申请日:
2016.11.01
申请国别(地区):
US
年份:
2020
代理人:
摘要:
An electron beam irradiation device includes: an electron beam generation part; a housing part that provides a vacuum space in which the electron beam generation part is accommodated; an electron beam guide part in which a base end side is connected to the housing part and communicates with the vacuum space, in which a tip end side is provided with a long tubular member capable of being inserted into a container via a mouth portion of the container, and in which the electron beams pass through an inside; an electron beam emission window which is provided on the tip end side of the electron beam guide part; and an adjustment part that adjusts a trajectory of the electron beams in the electron beam guide part. The adjustment part is disposed on the base end side of the electron beam guide part on an outside of the vacuum space.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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