INDIRECT DETERMINATION OF A PROCESSING PARAMETER

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专利权人:

ASML NETHERLANDS B.V.

发明人:

WANG, Te-Sheng

申请号：

WO2016EP72364

公开号：

WO2017063827(A1)

申请日:

2016.09.21

申请国别(地区):

世界知识产权组织国际局

年份:

2017

代理人:

摘要：

Disclosed herein is a method, comprising: measuring a value of a directly measureable processing parameter of a patterning process from a portion of a substrate produced by the patterning process; obtaining a relationship between the directly measureable processing parameter and a not directly measureable processing parameter; and determining a value of the not directly measureable processing parameter from the value of the directly measureable processing parameter and the relationship.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/