您的位置: 首页 > 农业专利 > 详情页

MANUFACTURING METHOD OF MICROSTRUCTURE AND MICROSTRUCTURE
专利权人:
FUJIFILM CORP
发明人:
TOMARU YUICHI
申请号:
JP20070264320
公开号:
JP2009090423(A)
申请日:
2007.10.10
申请国别(地区):
日本
年份:
2009
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide a manufacturing method of a new microstructure having a metal nanostructure which generates an intensified electric field by an antenna effect of a sharpened tip portion, and to provide the microstructure. SOLUTION: The manufacturing method of the microstructure includes a micropore-forming step, a metal filling step, and an exposure step. The micropore-forming step forms a micropore on a base material, wherein the micropore has an opening in a surface of the base material, an inside diameter varies in a depth direction, and it has a recessed portion which protrudes more slenderly at an end portion. The metal filling step fills the micropore with metal, and forms a metal microbody having a projection at a tip portion, wherein the projection consists of the metal filled into the protruded recessed portion. The exposure step removes at least a part of the base material from the tip portion side of the metal microbody, and exposes at least the projection at the tip portion of the metal microbody. The manufacturing method of the microstructure having the metal microbody to generate the intensified electric field includes these steps. COPYRIGHT: (C)2009,JPO&INPIT
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充