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X-RAY INTERFEROMETRIC IMAGING SYSTEM
专利权人:
Sigray; Inc.
发明人:
Wenbing Yun,Sylvia Jia yun Lewis,Janos Kirz,Alan Francis Lyon
申请号:
US16402887
公开号:
US20190254616A1
申请日:
2019.05.03
申请国别(地区):
US
年份:
2019
代理人:
摘要:
An x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The structures may be microstructures with lateral dimensions measured on the order of microns, and in some embodiments, the structures are arranged in a regular array.The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a π or π/2 phase-shifting grating, an x-ray detector to convert two-dimensional x-ray intensities into electronic signals, and in some embodiments, also comprises an additional analyzer grating G2 that may be placed in front of the detector to form additional interference fringes. Systems may also include a means to translate and/or rotate the relative positions of the x-ray source and the object under investigation relative to the beam splitting grating and/or the analyzer grating for tomography applications.
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