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X-RAY INTERFEROMETRIC IMAGING SYSTEM
专利权人:
Sigray; Inc.
发明人:
Wenbing Yun,Sylvia Jia Yun Lewis,Janos Kirz,Alan Francis Lyon,Yun, Wenbing,Lewis, Sylvia Jia Yun,Kirz, Janos,Lyon, Alan Francis
申请号:
US14527523
公开号:
US20150117599A1
申请日:
2014.10.29
申请国别(地区):
US
年份:
2015
代理人:
摘要:
We disclose an x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a π phase-shifting grating, and an x-ray detector to convert two-dimensional x-ray intensities into electronic signals. The system may also comprise a second analyzer grating G2 that may be placed in front of the detector to form additional interference fringes, and a means to translate the second grating G2 relative to the detector.In some embodiments, the structures are microstructures with lateral dimensions measured on the order of microns, and with a thickness on the order of one half of the electron penetration depth within the substrate. In some embodiments, the structures are formed within a regular array.
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