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粒子解析装置、およびプログラム
专利权人:
日本電子株式会社
发明人:
高倉 優
申请号:
JP20140021126
公开号:
JP6228858(B2)
申请日:
2014.02.06
申请国别(地区):
日本
年份:
2017
代理人:
摘要:
A particle analysis instrument is offered which can make a measurement in a shorter time than heretofore. The particle analysis instrument (100) is used to analyze a sample (S) containing plural particles by measuring the sample over plural fields of view. The instrument (100) includes a measuring section (10) for scanning primary rays (EB) over the sample (S) and detecting a signal emanating from the sample (S), a particle area totalizing portion (222) for finding the area of particles for each field of view from the results of the measurement made by the measuring section (10) and summing up such areas of particles for all of the fields of view to find a total area of particles, and a decision portion (226) for making a decision as to whether the measurement process should be ended, based on the ratio of the total area of particles to an area of the sample (S) measured to obtain the total area of particles.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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