- CHROME-FREE ETCH SOLUTIONS FOR CHEMICALLY RESISTANT POLYMER MATERIALS

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专利权人:

ROHM AND HAAS ELECTRONIC MATERIALS LLC

发明人:

CATHERINE MULZER

申请号：

KR20180078339

公开号：

KR20190011674(A)

申请日:

2018.07.05

申请国别(地区):

韩国

年份:

2019

代理人:

摘要：

Chemically resistant polymers are etched using a chrome-free etch solution, which is aqueous and alkaline. The chrome-free etch aqueous alkaline solution of the present invention is environmentally friendly and the chrome-free etch aqueous alkaline solution may be used in preparation of a chemically resistant polymer for electroless metal plating including plating of a through-hole wall in the manufacturing of a printed circuit board.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/