Mohamed Kanji;Chunhua Li;Hy Si Bui;Luis Ortega;Sarah Fairneny
发明人:
Hy Si Bui,Luis Ortega,Chunhua Li,Sarah Fairneny,Mohamed Kanji
申请号：
US13882644
公开号：
US20130213426A1
申请日:
2011.10.31
申请国别(地区):
US
年份:
2013
代理人:
摘要：
The present invention relates to a nail polish product, comprising: (1) a base coat composition containing: (i) at least one high gloss film forming agent chosen from a styrene maleic anhydride copolymer； (ii) at least one co-film forming agent chosen from an epoxy resin； (iii) at least one first solvent chosen from at least one volatile solvent and water； (iv) optionally, if water is employed as a first solvent, at least one auxiliary reactive agent chosen from a polyalkyleneamine or a combination of polyalkyleneamine and a polyurethane； (v) optionally, at least one colorant； and (vi) optionally, at least one plasticizer； and (2) a top coat composition containing: (i) at least one second solvent chosen from at least one volatile solvent and water； (ii) at least one main reactive agent chosen from at least one alkoxysilane comprising at least one solubilizing functional group and, if water is employed as a second solvent, at least one polyalkyleneamine or a combination of a polyalkyleneamine and a polyurethane； and (iii) optionally, at least one colorant, wherein the product does not require use of nitrocellulose and can be used to makeup or protect nails.
